Our company invests in new Electronic beam lithograph.
The new equipment will develop our origination system, adding a lot of new security features.
E-beam lithography is the technology created for microelectronics and meets all OVD’s requirements for resolution, flexibility and performance. This technique makes it possible of arbitrary topology creation while extreme resolution of nano-meter scale allows utilizing the recent development of digital holography.
The e-beam holograms are capable to control the light field (amplitude and phase of the light) as well as its polarization. Sub-micron structures with specific 3D profiles can produce unique optical effect such as 3D visualization, motion, color selectivity and much more complicated security futures.
That is the reason why we choose the e-beam lithography as our primary holograms’ mastering technology.
The equipment have been installed in November 2014.